○ Name: Trimethylsilylamine (TSA)

○ Purity:8N

○ Annual Capacity: 50 tons

○ Features: Highly volatile, carbon-free and chlorine-free silicon source, improving thin-film deposition quality and efficiency, suitable for advanced ALD processes.

○ Applications: Used for ALD in advanced processes, suitable for high-aspect-ratio structure and silicon nitride film preparation.