Silane is a toxic compound that exists as a gas at room temperature. Its properties are quite similar to those of ethane, both being colorless and flammable gases. However, the silicon-silicon bonds in silane are weaker than the carbon-carbon bonds in ethane, making it even less stable than ethane. Silane is usually a good source of hydrogen, which can be obtained through simple chemical reactions.

PURPOSE

Silane and ethylsilane decompose at 640°C, resulting in the deposition of amorphous silicon. This chemical vapor deposition process is related to the manufacturing of photovoltaic devices. It is used to produce silicon crystals. Ethylsilane gas can be used to control the pressure of Si vapor during the thermal decomposition growth of graphene in SiC. The pressure of Si vapor affects the quality of the produced graphene.

○ Purity: 4N

○ Annual Capacity: 50 tons

○ with low deposition temperature, fast film formation and excellent film quality. Features: Suitable for advanced semiconductor processes,

○ CVD, ion implantation, etc. Applications: Used for amorphous silicon growth, epitaxy,

○ Fields: semiconductors, integrated circuits, solar cells

QUALITY CONTROL INDICATORS

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